Publications

During the more than 20 years, our team of researchers at the Center has written many scientific papers published in the most prestigious scientific magazines and newspapers, both nationally and internationally. Here are some of the most recent works published.
Publications by Year
During the more than 20 years, our team of researchers at the Center has written many scientific papers published in the most prestigious scientific magazines and newspapers, both nationally and internationally. Here are some of the most recent works published.
Papers published 2002
I. Ferreira, E. Fortunato and R. Martins. “Hot-wire plasma assisted chemical vapor deposition: A
deposition technique to obtain silicon thin films”. Journal of Applied Physics, Vol. 91, (3), (2002) pp.
1644-1649
Papers published 2001
H. Águas, R. Martins, E Fortunato. “Role of ion bombardment on the properties of a-Si:H films”.
Vacuum, 60 (2001) pp. 247-254.
Papers published 2000
R. Martins, V. Silva, I. Ferreira, A. Domingues and E. Fortunato. “Role of the gas temperature and
power to gas flow ratio on powder formation and properties of films grown by PECVD technique”.
Materials Science & Engineering B, 69-70, (2000), pp. 272-277.
Books and Chapters of books
R. MARTINS, I. FERREIRA, E. FORTUNATO AND G. KROESEN, Plasma Processing and Dusty Particles”, Materials Science Forum. Trans Tech Publications, volume 382 (2001).