Publications
During the more than 20 years, our team of researchers at the Center has written many scientific papers published in the most prestigious scientific magazines and newspapers, both nationally and internationally. Here are some of the most recent works published.
Publications by Year
During the more than 20 years, our team of researchers at the Center has written many scientific papers published in the most prestigious scientific magazines and newspapers, both nationally and internationally. Here are some of the most recent works published.
E. Fortunato, P. Barquinha, A. Pimentel, L. Pereira, G. Gonçalves and R. Martins. “Amorphous IZO TTFTs with saturation mobilities exceeding 100 cm2V-1s-1”, Phys. stat. sol. RRL 1 (1) (2007) R34-R36.
Elvira Fortunato, Alexandra Gonçalves, António Torres Marques, Ana Pimentel, Pedro Barquinha, Hugo Águas, Luís Pereira, Leandro Raniero, Gonçalo Gonçalves, Isabel Ferreira, R. Martins, “Multifunctional Thin Film Zinc Oxide Semiconductors: Application to Electronic Devices”. Materials Science Forum (Advanced Materials Forum III) 514-516, (2006) pp. 3-7
H. Águas, L. Pereira, D. Costa, E. Fortunato, R. Martins. “Super linear position sensitive detectors using MIS structures”. Optical Materials, 27 (2005), pp. 1088-1092.
E. Fortunato, A. Gonçalves, A. Marques, A. Viana, H. Águas, L. Pereira, I. Ferreira, P. Vilarinho, R. Martins. “New developments in galium doped zinc oxide deposited on polymeric substrates by rf magnetron sputtering”. Surface and Coatings Technology, 180-181(2004) pp. 20-25.
V. Assunção, E. Fortunato, A. Marques, R. Martins. “Influence of the deposition pressure on the
properties of transparent and conductive ZnO:Ga thin film produced by rf magnetron sputtering at
room temperature”. Thin Solid Films, 427 (2003) pp. 401-406.
properties of transparent and conductive ZnO:Ga thin film produced by rf magnetron sputtering at
room temperature”. Thin Solid Films, 427 (2003) pp. 401-406.
I. Ferreira, E. Fortunato and R. Martins. “Hot-wire plasma assisted chemical vapor deposition: A
deposition technique to obtain silicon thin films”. Journal of Applied Physics, Vol. 91, (3), (2002) pp.
1644-1649
deposition technique to obtain silicon thin films”. Journal of Applied Physics, Vol. 91, (3), (2002) pp.
1644-1649
H. Águas, R. Martins, E Fortunato. “Role of ion bombardment on the properties of a-Si:H films”.
Vacuum, 60 (2001) pp. 247-254.
Vacuum, 60 (2001) pp. 247-254.
R. Martins, V. Silva, I. Ferreira, A. Domingues and E. Fortunato. “Role of the gas temperature and
power to gas flow ratio on powder formation and properties of films grown by PECVD technique”.
Materials Science & Engineering B, 69-70, (2000), pp. 272-277.
power to gas flow ratio on powder formation and properties of films grown by PECVD technique”.
Materials Science & Engineering B, 69-70, (2000), pp. 272-277.